Korean chip manufacturer Samsung is planning to introduce high-NA extreme ultraviolet (EUV) lithography into its production facilities to manufacture chips with the 1-nanometer manufacturing process node. The report comes courtesy Samsung Electronics’ VP of Technology, ChangMin Park, and it adds that Samsung will rely on the latest lithography machines for volume production of the chips. These chips could enter mass production as early as 2030, with the Samsung executive outlining the details at a conference held in Korea. Samsung VP Says High NA’s Lack Of Refinement Led To Delay In Application Advances in semiconductor fabrication create limits when circuit sizes […]
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